Packaging Materials in High-Performance Computing Applications
As the BEOL process is limited in using SiO 2 as the material, the date rate of the silicon interposers remain low (2 Gbps) and also has higher latency. Latency 3 results from the higher capacitance of SiO 2 as can be seen from the below equation where higher dielectric constant lead to high capacitance, which will lead to an increased RC (resistance × …